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Unknown · United States

Gordon Moore Park / D1X

Intel · Hillsboro, Oregon
Company
Intel
Facility role
Technology development and wafer fabrication
Processes
Undisclosed
Evidence as of
2026-08-28

Evidence boundary

EQUIPMENT

High-NA EUV lithography system · ASML

First commercial High-NA system; this is not a count of all EUV tools on campus.

reported-exact · 2026-08-28Intel High-NA EUV press kit ↗