MarketTWINSCAN EXE:5200
ASML · 1 publicly reported
This count covers the specifically announced High-NA tool, not every lithography system at imec.
imec advanced patterning infrastructure ↗R&D / pilot · Belgium
Leuven Research Infrastructure
imec · LeuvenPublic facility record
- Facility type
- Research
- Status
- R&D / pilot
- Location precision
- campus
- Public role
- Semiconductor R&D and pilot infrastructure
- Site roles
- Semiconductor R&D · Pilot line
- Products
- Not disclosed in selected source
- Processes
- Not disclosed in selected source
- Wafer sizes
- 300 mm
- Public scale
- 300 mm research program publicly described
- Verified
- 2026-08-26
Public equipment disclosures
Public relationships
imec → ASML
Joint High-NA EUV lab and pilot-line program
imec advanced patterning infrastructure ↗This record does not infer parcel coordinates, facility capacity, ownership, or undisclosed equipment totals.